Flow Measurement in CMP

Enhancing Precision in Chemical Mechanical Planarization with SEMIFLOW® Clamp-On Flow Sensors

Chemical Mechanical Planarization (CMP) plays a key role in semiconductor manufacturing. In order to achieve best results, highest accuracy is crucial in slurry management. Thus, effective flow measurement with non-contact ultrasonic clamp-on flow sensors of the SEMIFLOW series is necessary in CMP.

Featured Product: SEMIFLOW CO.65

Flow Measurement in Chemical Mechanical Planarization (CMP)

Flow Measurement in Chemical Mechanical Planarization

Enhancing Precision

Slurry dispensing demands precision, as even minor discrepancies can lead to uneven material removal and defects. SEMIFLOW non-contact clamp-on flow meters regulate the rate at which the slurry is delivered, ensuring a consistent and uniform distribution. This, in turn, promotes surface flatness and minimizes waste.

Flow Sensors for Slurry Management

In CMP perfection is the goal. Flow sensors are important instruments that enable proper and precise slurry management. They enable controlled, reliable and efficient processes, underlining their importance in achieving the highest quality results in clean room manufacturing environments.

More Information about Ultrasonic Flow Meters

Product Overview

Ultrasonic Flow Meter

More Applications

Application Notes for Semiconductor Industry


Knowledge Center

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Anja Lausch

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